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Precision Optical Windows and Sapphire Wafer Producer

What products do we offer?

We are Guizhou Huoying Technology Co., Ltd., from Guizhou, China. We provide silicon carbide wafers, sapphire wafers, special glass, epitaxial wafers, YAG laser wafers, YSZ single crystals, silicon wafers, etc. to global customers.

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Whatsapp/微信/Tel：+86-13262739223
China's high-quality wafer and sapphire substrate provider

CZ silicon wafers

20250306153759
Contact information for manufacturers of silicon carbide wafers, sapphire substrates, and YAG laser crystals

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Specification for CZ Growth Siliocn Wafer

Grade Dimeter Type/dopant Orientaion thickness Resistivity Flat Surface/Roughness Geometric parameter
(最优)Prime 25.4mm 50.8mm 76.5mm P(Boron) N(Phos/As/Sb) <100> <111> or special orientation 400um+/-20 400um+/- 20 400um+/-20 0.0001 – 200 Ohm-cm /Customization N/A 16mm 22.5mm polished/etched polished/polished TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
100mm 125mm 150mm P(Boron) N(Phos/As/Sb) <100> <111> or special orientation 525um+/-20 625um+/-20 625um+/-20 0.0001 – 200 Ohm-cm /Customization 32.5mm 42.5mm 57.5mm polished/etched polished/polished TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
200mm P(Boron) N(Phos/As/Sb) <100> <111> or special orientation 725um+/-20 0.0001 – 200 Ohm-cm /Customization nothch/flat polished/etched polished/polished TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
300mm P(Boron) N(Phos/As/Sb) <100> <111> or special orientation 775um+/-20 0.0001 – 200 Ohm-cm /Customization notch/flat polished/etched polished/polished TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30umRa<0.5nm
挡片 控片(Dummy） 25.4mm 50.8mm 76.5mm P(Boron) N(Phos/As/Sb) <100> <111> or special orientation 400um+/-20 400um+/- 20 400um+/-20 0.0001 – 200 Ohm-cm /Customization N/A 16mm 22.5mm polished/etched polished/polished TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
100mm 125mm 150mm P(Boron) N(Phos/As/Sb) <100> <111> or special orientation 525um+/-20 625um+/-20 625um+/-20 0.0001 – 200 Ohm-cm /Customization 32.5mm 42.5mm 57.5mm polished/etched polished/polished TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
200mm P(Boron) N(Phos/As/Sb) <100> <111> or special orientation 725um+/-20 0.0001 – 200 Ohm-cm /Customization nothch/flat polished/etched polished/polished TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
300mm P(Boron) N(Phos/As/Sb) <100> <111> or special orientation 775um+/-20 0.0001 – 200 Ohm-cm /Customization notch/flat polished/etched polished/polished TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30umRa<0.5nm
extra thick wafer 25.4mm 50.8mm 76.5mm P(Boron) N(Phos/As/Sb) <100> <111> or special orientation >=1000um customization 0.0001 – 200 Ohm-cm /Customization N/A 16mm 22.5mm polished/etched polished/polished TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
100mm 125mm 150mm P(Boron) N(Phos/As/Sb) <100> <111> or special orientation >=1000um customization 0.0001 – 200 Ohm-cm /Customization 32.5mm 42.5mm 57.5mm polished/etched polished/polished TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
200mm P(Boron) N(Phos/As/Sb) <100> <111> or special orientation >2000um customization 0.0001 – 200 Ohm-cm /Customization notch/flat polished/etched polished/polished TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
300mm P(Boron) N(Phos/As/Sb) <100> <111> or special orientation >2000um customization 0.0001 – 200 Ohm-cm /Customization notch/flat polished/etched polished/polished TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
extra thin wafer 25.4mm 50.8mm 76.5mm P(Boron) N(Phos/As/Sb) <100> <111> or special orientation 100um 200um customization 0.0001 – 200 Ohm-cm /Customization N/A 16mm 22.5mm polished/etched polished/polished TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
100mm 125mm 150mm P(Boron) N(Phos/As/Sb) <100> <111> or special orientation 1000um 2000um customization 0.0001 – 200 Ohm-cm /Customization 16mm+/-2mm polished/etched polished/polished TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
200mm P(Boron) N(Phos/As/Sb) <100> <111> or special orientation 1000um 2000um customization 0.0001 – 200 Ohm-cm /Customization 16mm+/-2mm polished/etched polished/polished TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
300mm P(Boron) N(Phos/As/Sb) <100> <111> or special orientation 1000um 2000um customization 0.0001 – 200 Ohm-cm /Customization 16mm+/-2mm polished/etched polished/polished TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
extra flat wafer 25.4mm 50.8mm 76.5mm P(Boron) N(Phos/As/Sb) <100> <111> or special orientation 400um+/-20 400um+/- 20 400um+/-20 0.0001 – 200 Ohm-cm /Customization N/A 16mm 22.5mm polished/etched polished/polished TTV < 2um TIR <1um STIR < 1um BOW < 10um Warp < 10um Ra<0.5nm
100mm 125mm 150mm P(Boron) N(Phos/As/Sb) <100> <111> or special orientation 525um+/-20 625um+/-20 625um+/-20 0.0001 – 200 Ohm-cm /Customization 32.5mm 42.5mm 57.5mm polished/etched polished/polished TTV < 2um TIR <1um STIR < 1um BOW < 10um Warp < 10um Ra<0.5nm
200mm P(Boron) N(Phos/As/Sb) <100> <111> or special orientation 725um+/-20 0.0001 – 200 Ohm-cm /Customization nothch/flat polished/etched polished/polished TTV < 2um TIR <1um STIR < 1um BOW < 10um Warp < 10um
300mm P(Boron) N(Phos/As/Sb) <100> <111> or special orientation 775um+/-20 0.0001 – 200 Ohm-cm /Customization notch/flat polished/etched polished/polished TTV < 2um TIR <1um STIR < 1um BOW < 10um Warp < 10um Ra<0.5nm

CZ silicon wafers

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